High-power magnetron sputtering typically includes sputtering techniques such as HiPIMS, pulsed-DC but also continuous-DC with extremely efficient target cooling. The main advantage of high-power sputtering is the higher ionization degree of the sputtered metal. Despite the fact that this class of sputtering processes is becoming predominant in the PVD coating industry, works aiming for a quantitative theoretical description are still rare. This is mostly due to the high complexity of the underlying physics. The aim of the thesis is to create sub-models capable of describing individual kinetic phenomena in high-power magnetron processes. To that end, the student will use either a multi-weight particle-in-cell code or a multi-fluid hydrodynamic code describing the plasma. Apart from testing and comparing the suitability of various numerical strategies for high-power sputtering, the student will use the models to describe such effects as gas rarefaction, charge exchange or strongly non-Maxwellian electron velocity distributions. The thesis is connected to the applied research project TREND OPTIMISM and the student will leverage numerical simulation tools that are being jointly developed by MU and PlasmaSolve s.r.o. within the project.