In the context of the thesis a systematically study of the magnetron sputtering deposition process driven by high power pulses will performed both in non-reactive and reactive regime.
For this purpose a spectroscopic technique based on effective branching fractions will be further developed to determine the number densities of the sputtered species in their ground levels. Possibility to determine the Ti, Cu and Al atom and ion densities will be verified. This technique will be cross-validated by other techniques such as resonant optical absorption spectroscopy or LIF.
The aim is to thoroughly characterize and understand the behavior of the non-reactive and reactive HIPIMS deposition process for different excitation pulse conditions – short, medium voltage pulses (Ar dominated HIPIMS), long and/or high voltage pulses (self-sputtering, possible presence of spoke instabilities), low repetition frequencies (no pulse to pulse influence), high repetition frequencies or multi-pulse operation (pulse to pulse influence). Evolution of the target state during reactive HIPIMS pulse will be determined from the measured evolutions. The fast feedback device will be employed to control reactive HIPIMS deposition process.